[IEEE IEEE 1998 International Interconnect Technology...

  • Main
  • [IEEE IEEE 1998 International...

[IEEE IEEE 1998 International Interconnect Technology Conference - San Francisco, CA, USA (1-3 June 1998)] Proceedings of the IEEE 1998 International Interconnect Technology Conference (Cat. No.98EX102) - Correlation of film thickness and deposition temperature with PAI and the scalability of Ti-salicide technology to sub-0.18 μm regime

Ho, C.S., Karunasiri, R.P.G., Chua, S.J., Pey, K.L., Siah, S.Y., Lee, K.H., Chan, L.H.
How much do you like this book?
What’s the quality of the file?
Download the book for quality assessment
What’s the quality of the downloaded files?
Year:
1998
Language:
english
DOI:
10.1109/iitc.1998.704789
File:
PDF, 387 KB
english, 1998
Conversion to is in progress
Conversion to is failed