Temperature dependence of silicon nitride deposited by...

physica status solidi (a) 2014 / 09 Vol. 211; Iss. 9

Temperature dependence of silicon nitride deposited by remote plasma atomic layer deposition

Jang, Woochool, Jeon, Heeyoung, Kang, Chunho, Song, Hyoseok, Park, Jingyu, Kim, Hyunjung, Seo, Hyungtak, Leskela, Markku, Jeon, Hyeongtag
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Volume:
211
Language:
english
Journal:
physica status solidi (a)
DOI:
10.1002/pssa.201431162
Date:
September, 2014
File:
PDF, 723 KB
english, 2014
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