![](/img/cover-not-exists.png)
[IEEE 2014 14th International Workshop on Junction Technology (IWJT) - Shanghai, China (2014.5.18-2014.5.20)] 2014 International Workshop on Junction Technology (IWJT) - Heated ion implantation technology for FinFET application
Onoda, Hiroshi, Mizubayashi, Wataru, Nakashima, Yoshiki, Masahara, MeishokuYear:
2014
Language:
english
DOI:
10.1109/iwjt.2014.6842045
File:
PDF, 1.35 MB
english, 2014