[IEEE ICVC'99. 6th International Conference on VLSI and CAD...

  • Main
  • [IEEE ICVC'99. 6th International...

[IEEE ICVC'99. 6th International Conference on VLSI and CAD - Seoul, South Korea (26-27 Oct. 1999)] ICVC '99. 6th International Conference on VLSI and CAD (Cat. No.99EX361) - Profile simulation and stress analysis for optimization of an intermetal dielectric deposition (IMD) process

Tai-Kyung Kim,, Won-Young Chung,, Hong-Jae Shin,, Jai-Jun Oh,, Jai-Kwang Shin,, Jeoung-Taek Kong,
How much do you like this book?
What’s the quality of the file?
Download the book for quality assessment
What’s the quality of the downloaded files?
Year:
1999
Language:
english
DOI:
10.1109/icvc.1999.820822
File:
PDF, 299 KB
english, 1999
Conversion to is in progress
Conversion to is failed