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[IEEE 2009 IEEE/SEMI Advanced Semiconductor Manufacturing Conference (ASMC) - Berlin, Germany (2009.05.10-2009.05.12)] 2009 IEEE/SEMI Advanced Semiconductor Manufacturing Conference - Poly-width-modification method for canceling layout-dependent characteristic variations for low-standby-power CMOS technologies
Satoshi Nakai,, Kazushi Fujita,, Takayoshi Minami,, Junichi Mitani,, Toshio Sawano,, Tatsuo Chijimatsu,, Tatsuya Deguchi,, Satoru Asai,, Masato Suga,Year:
2009
Language:
english
DOI:
10.1109/asmc.2009.5155954
File:
PDF, 502 KB
english, 2009