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[Japan Soc. Promotion of Sci International Vacuum Microelectronics Conference - Osaka, Japan (7-11 July 2003)] IEEE/CPMT/SEMI. 28th International Electronics Manufacturing Technology Symposium (Cat. No.03CH37479) - A silicon gated field edge cathode
Dyuzhev, N.A., Beliaev, S.N., Vlasenko, V.A., Gogin, A.A., Gontar, V.M., Deniskin, V.V., Mazaev, A.A., Nevsky, A.B., Tishin, Y.I., Shokin, A.N.Year:
2003
Language:
english
DOI:
10.1109/ivmc.2003.1223041
File:
PDF, 137 KB
english, 2003