Individual Roles of Atoms and Ions during Hydrogen Plasma...

Japanese Journal of Applied Physics 2012 / 10 Vol. 51

Individual Roles of Atoms and Ions during Hydrogen Plasma Passivation of Surface Defects on GaN Created by Plasma Etching

Chen, Shang, Ishikawa, Kenji, Lu, Yi, Kometani, Ryosuke, Kondo, Hiroki, Tokuda, Yutaka, Egawa, Takashi, Amano, Hiroshi, Sekine, Makoto, Hori, Masaru
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Volume:
51
Language:
english
Journal:
Japanese Journal of Applied Physics
DOI:
10.1143/JJAP.51.111002
Date:
October, 2012
File:
PDF, 645 KB
english, 2012
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