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[IEEE Symposium on VLSI Technology - Kyoto, Japan (1997.06.12-1997.06.12)] Symposium on VLSI Technology - A Superior TiN/TiSi/sub 2/ Barrier Layer By Using Sputter Deposition From A TiN/sub 0.4/ Alloy Target And Subsequent RTN
Nakamura,, Fushimi,, Sakaya,, Ajioka,, Hiraki,, Kubota,Year:
1993
Language:
english
DOI:
10.1109/vlsit.1993.760281
File:
PDF, 235 KB
english, 1993