[IEEE 2013 International Conference on Simulation of...

  • Main
  • [IEEE 2013 International Conference on...

[IEEE 2013 International Conference on Simulation of Semiconductor Processes and Devices (SISPAD) - Glasgow, United Kingdom (2013.09.3-2013.09.5)] 2013 International Conference on Simulation of Semiconductor Processes and Devices (SISPAD) - Density Gradient calibration for 2D quantum confinement: Tri-Gate SOI transistor application

Pons, N., Triozon, F., Jaud, M.-A., Coquand, R., Martinie, S., Rozeau, O., Niquet, Y.-M., Nguyen, V.-H., Oudrhiri, A. Idrissi-El, Barraud, S.
How much do you like this book?
What’s the quality of the file?
Download the book for quality assessment
What’s the quality of the downloaded files?
Year:
2013
Language:
english
DOI:
10.1109/sispad.2013.6650605
File:
PDF, 1.23 MB
english, 2013
Conversion to is in progress
Conversion to is failed