The influence of ion implantation conditions on defect formation and amorphisation in silicon
Zukovski, P. V., Kiszczak, K., Maczka, D., Latuszynski, A.Volume:
132
Language:
english
Journal:
Radiation Effects and Defects in Solids
DOI:
10.1080/10420159408219251
Date:
September, 1994
File:
PDF, 472 KB
english, 1994