[IEEE IEEE Conference Record - Abstracts. 1999 IEEE...

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[IEEE IEEE Conference Record - Abstracts. 1999 IEEE International Conference on Plasma Science. 26th International Conference - Monterey, CA, USA (20-24 June 1999)] IEEE Conference Record - Abstracts. 1999 IEEE International Conference on Plasma Science. 26th IEEE International Conference (Cat. No.99CH36297) - Effects of RF plasma processing on the impedance and electron emission characteristics of a MV beam diode

Rintamaki, J.I., Gilgenbach, R.M., Cohen, W.E., Jaynes, R.L., Ang, L.K., Lau, Y.Y., Cuneo, M.E., Menge, P.R.
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Year:
1999
Language:
english
DOI:
10.1109/plasma.1999.829622
File:
PDF, 102 KB
english, 1999
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