Steam stability of a silica membrane prepared by...

Steam stability of a silica membrane prepared by counterdiffusion chemical vapor deposition

Mikihiro Nomura, Hitoshi Aida, Suraj Gopalakrishnan, Takashi Sugawara, Shin-ichi Nakao, Satoshi Yamazaki, Takeshi Inada, Yuji Iwamoto
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Volume:
193
Year:
2006
Language:
english
Pages:
7
DOI:
10.1016/j.desal.2005.08.019
File:
PDF, 494 KB
english, 2006
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