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[IEEE 2010 10th IEEE International Conference on Solid-State and Integrated Circuit Technology (ICSICT) - Shanghai, China (2010.11.1-2010.11.4)] 2010 10th IEEE International Conference on Solid-State and Integrated Circuit Technology - Electrical and physical characteristics of the high-K Tb2O3 (terbium) dielectric deposited on the polycrystalline silicon
Kao, Chyuan-Haur, Chen, Hsian, Chen, Kung-Shao, Lai, Pei-Lun, Cheng, Shih-Nan, Liao, Chien-Jung, Wang, Hsin-Yuan, Hsieh, Chih-Hung, Lin, Chia-HanYear:
2010
Language:
english
DOI:
10.1109/icsict.2010.5667535
File:
PDF, 524 KB
english, 2010