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Hetero-Epitaxial Growth of Lower Boron Arsenide on Si Substrate Using AsH 3 -B 2 H 6 -H 2 System
Hirayama, Makoto, Shohno, KatsufusaVolume:
12
Journal:
Japanese Journal of Applied Physics
DOI:
10.1143/JJAP.12.1960
Date:
December, 1973
File:
PDF, 533 KB
1973