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[IEEE 1st International Symposium on Plasma Process-Induced Damage - Santa Clara, CA (13-14 May 1996)] Proceedings of 1st International Symposium on Plasma Process-Induced Damage - Gate Material Dependence Of Process Charging Damage In Thin Gate Oxide
Acovic, A., Ray, A., Sun, J., Herman, J., Furukawa, T., Geiger, R., Beyer, K., McGahay, V., Greco, S., Abadeer, W.Year:
1996
Language:
english
DOI:
10.1109/ppid.1996.715228
File:
PDF, 415 KB
english, 1996