[IEEE 2007 International Semiconductor Device Research Symposium - College Park, MD, USA (2007.12.12-2007.12.14)] 2007 International Semiconductor Device Research Symposium - Comparisons on performance improvement by nitride capping layer among different channel directions nMOSFETs
Tzu-I Tsai,, Yao-Jen Lee,, King-Sheng Chen,, Jeff Wang,, Fu-Kuo Hsueh,, Horng-Chih Lin,, Tiao-Yuan Huang,Year:
2007
Language:
english
DOI:
10.1109/isdrs.2007.4422402
File:
PDF, 244 KB
english, 2007