[IEEE 2011 IEEE International Reliability Physics Symposium (IRPS) - Monterey, CA, USA (2011.04.10-2011.04.14)] 2011 International Reliability Physics Symposium - Electromigration-resistance enhancement with CoWP or CuMn for advanced Cu interconnects
Christiansen, Cathryn, Li, Baozhen, Angyal, Matthew, Kane, Terence, McGahay, Vincent, Wang, Yun Yu, Yao, ShaoningYear:
2011
Language:
english
DOI:
10.1109/irps.2011.5784493
File:
PDF, 747 KB
english, 2011