Extreme Ultraviolet Interferometric Lithography: A Path to...

Synchrotron Radiation News 2008 / 08 Vol. 21; Iss. 4

Extreme Ultraviolet Interferometric Lithography: A Path to Nanopatterning

Cerrina, F., Isoyan, A., Jiang, F., Cheng, Y. C., Leonard, Q., Wallace, J., Heinrich, K., Ho, A., Efremov, M., Nealey, P.
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Volume:
21
Language:
english
Journal:
Synchrotron Radiation News
DOI:
10.1080/08940880802268236
Date:
August, 2008
File:
PDF, 6.25 MB
english, 2008
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