[IEEE 2005 International Conference On Simulation of Semiconductor Processes and Devices - Tokyo, Japan (2005.09.3-2005.09.3)] 2005 International Conference On Simulation of Semiconductor Processes and Devices - Three-Dimensional Simulation of Stress Dependent Thermal Oxidation
Hollauer, Ch., Ceric, H., Selberherr, S.Year:
2005
Language:
english
DOI:
10.1109/sispad.2005.201503
File:
PDF, 2.48 MB
english, 2005