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[IEEE 2010 10th IEEE International Conference on Solid-State and Integrated Circuit Technology (ICSICT) - Shanghai, China (2010.11.1-2010.11.4)] 2010 10th IEEE International Conference on Solid-State and Integrated Circuit Technology - Metal-gate/high-к CMOS scaling from Si to Ge at small EOT
Chin, Albert, Chen, W. B., Shie, B. S., Hsu, K. C., Chen, P. C., Cheng, C. H., Chi, C. C., Wu, Y. H., Chaing-Liao, K. S., Wang, S. J., Kuan, C. H., Yeh, F. S.Year:
2010
Language:
english
DOI:
10.1109/icsict.2010.5667443
File:
PDF, 376 KB
english, 2010