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[IEEE IEEE InternationalElectron Devices Meeting, 2005. IEDM Technical Digest. - Tempe, Arizon, USA (Dec. 5, 2005)] IEEE InternationalElectron Devices Meeting, 2005. IEDM Technical Digest. - Novel transition layer engineered si nanocrystal flash memory with NHSOS structure featuring large V/sub th/ window and fast P/E speed.
Kyong-Hee Joo,, Xiofeng Wang,, Jeong Hee Han,, Seung-Hyun Lim,, Seung-Jae Baik,, Yong-Won Cha,, Jin Wook Lee,, In-Seok Yeo,, Young-Kwan Cha,, In Kyeong Yoo,, U-In Chung,, Joo Tae Moon,, ByYear:
2005
Language:
english
DOI:
10.1109/iedm.2005.1609494
File:
PDF, 700 KB
english, 2005