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[IEEE ICVC'99. 6th International Conference on VLSI and CAD - Seoul, South Korea (26-27 Oct. 1999)] ICVC '99. 6th International Conference on VLSI and CAD (Cat. No.99EX361) - 40 nm electron beam patterning and its application to silicon nano-structure fabrication
Sangyeon Han,, Taejnn Park,, Bonkee Kim,, Hyungcheol Shin,, Kwyro Lee,Year:
1999
Language:
english
DOI:
10.1109/icvc.1999.820860
File:
PDF, 317 KB
english, 1999