[IEEE 2014 7th International Silicon-Germanium Technology and Device Meeting (ISTDM) - Singapore, Singapore (2014.6.2-2014.6.4)] 2014 7th International Silicon-Germanium Technology and Device Meeting (ISTDM) - SiGe channel deposition by batch epitaxy
Reichel, Carsten, Schoenekess, Joerg, Dietel, Andreas, Wasyluk, Joanna, Yew Tuck Chow,, Kammler, ThorstenYear:
2014
DOI:
10.1109/istdm.2014.6874685
File:
PDF, 2.34 MB
2014