[IEEE 2010 23rd Annual Meeting of the IEEE Photonics Society (Formerly LEOS Annual Meeting) - Denver, CO, USA (2010.11.7-2010.11.11)] 2010 IEEE Photinic Society's 23rd Annual Meeting - Laser based aerial microscope for at-wavelength characterization of extreme ultraviolet lithography masks
Carbajo, S., Brizuela, F., Martz, D. H., Alessi, D., Wang, Y., Marconi, M. C., Rocca, J. J., Menoni, C. S., Sakdinawat, A., Anderson, E., Goldberg, K. A., Attwood, D. T., La Fontaine, B.Year:
2010
Language:
english
DOI:
10.1109/photonics.2010.5699022
File:
PDF, 312 KB
english, 2010