![](/img/cover-not-exists.png)
[IEEE 2010 21st Annual IEEE/SEMI Advanced Semiconductor Manufacturing Conference (ASMC) - San Francisco, CA, USA (2010.07.11-2010.07.13)] 2010 IEEE/SEMI Advanced Semiconductor Manufacturing Conference (ASMC) - Navigating in the density plane – achieving flat wafer surface and uniform metal thickness in CMP processes
Melzner, Hanno, Cui, Ning, Postnikov, SergeiYear:
2010
Language:
english
DOI:
10.1109/asmc.2010.5551446
File:
PDF, 953 KB
english, 2010