Simulation on Boron Concentration Profile in Silicon Introduced by Plasma Doping
Yu, Min, Ji, Huihui, Wang, Jinyan, Jin, Yufeng, Huang, Ru, Zhang, XingVolume:
38
Language:
english
Journal:
IEEE Transactions on Plasma Science
DOI:
10.1109/tps.2010.2048721
Date:
September, 2010
File:
PDF, 827 KB
english, 2010