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[IEEE 2006 International Symposium on VLSI Technology, Systems, and Applications - Hsinchu, Taiwan (2006.4.24-2006.4.24)] 2006 International Symposium on VLSI Technology, Systems, and Applications - Challenges for process and product integration at 45nm
Stork, HansYear:
2006
DOI:
10.1109/vtsa.2006.251112
File:
PDF, 312 KB
2006