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Properties of ferroelectric/ferromagnetic thin film heterostructures
Chen, Daming, Harward, Ian, Linderman, Katie, Economou, Evangelos, Nie, Yan, Celinski, ZbigniewVolume:
115
Language:
english
Journal:
Journal of Applied Physics
DOI:
10.1063/1.4865316
Date:
May, 2014
File:
PDF, 641 KB
english, 2014