Influence of CH 4 partial pressure on the microstructure of sputter-deposited tungsten carbide thin films
Abdelouahdi, K, Sant, C, Miserque, F, Aubert, P, Zheng, Y, Legrand-Buscema, C, Perrière, JVolume:
18
Language:
english
Journal:
Journal of Physics: Condensed Matter
DOI:
10.1088/0953-8984/18/6/008
Date:
February, 2006
File:
PDF, 703 KB
english, 2006