On the annealing of damage produced by copper ion...

Radiation Effects 1974 / 01 Vol. 23; Iss. 1

On the annealing of damage produced by copper ion implantation of silicon single crystals

Chadderton, Lewis T., Whitton, James L.
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Volume:
23
Language:
english
Journal:
Radiation Effects
DOI:
10.1080/00337577408232047
Date:
January, 1974
File:
PDF, 645 KB
english, 1974
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