Metal-assisted etching of p-type silicon under anodic polarization in HF solution with and without H2O2
Mohamed L. Chourou, Kazuhiro Fukami, Tetsuo Sakka, Sannakaisa Virtanen, Yukio H. OgataVolume:
55
Year:
2010
Language:
english
Pages:
10
DOI:
10.1016/j.electacta.2009.09.048
File:
PDF, 2.43 MB
english, 2010