Photoelectron diffraction study and structure determination of ultrathin hafnium silicide layers on silicon(1 0 0) using Mg Kα radiation and synchrotron light
C.R. Flüchter, A. de Siervo, D. Weier, M. Schürmann, U. Berges, S. Dreiner, M.F. Carazzolle, R. Landers, G.G. Kleiman, C. WestphalVolume:
156-158
Year:
2007
Language:
english
Pages:
5
DOI:
10.1016/j.elspec.2006.11.028
File:
PDF, 708 KB
english, 2007