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[IEEE 2014 IEEE Symposium on VLSI Technology - Honolulu, HI, USA (2014.6.9-2014.6.12)] 2014 Symposium on VLSI Technology (VLSI-Technology): Digest of Technical Papers - 15nm-WFIN high-performance low-defectivity strained-germanium pFinFETs with low temperature STI-last process
Mitard, J., Witters, L., Loo, R., Lee, S.H., Sun, J.W., Franco, J., Ragnarsson, L.-A., Brand, A., Lu, X., Yoshida, N., Eneman, G., Brunco, D. P., Vorderwestner, M., Storck, P., Milenin, A.P., Hikavyy,Year:
2014
Language:
english
DOI:
10.1109/vlsit.2014.6894391
File:
PDF, 1.11 MB
english, 2014