[IEEE 2008 9th International Conference on Solid-State and Integrated-Circuit Technology (ICSICT) - Beijing, China (2008.10.20-2008.10.23)] 2008 9th International Conference on Solid-State and Integrated-Circuit Technology - A 45nm low power bulk technology featuring carbon co-implantation and laser anneal on 45°-rotated substrate
Yuan, J., Chan, V., Eller, M., Rovedo, N., Lee, H. K., Gao, Y., Sardesai, V., Kanike, N., Vidya, V., Kwon, O., Kwon, O. S., Yan, J., Fang, S., Wille, W., Wang, H., Chow, Y. T., Booth, R., Kebede, T.,Year:
2008
Language:
english
DOI:
10.1109/icsict.2008.4734744
File:
PDF, 4.67 MB
english, 2008