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[IEEE IEEE International Electron Devices Meeting - San Francisco, CA, USA (8-11 Dec. 2002)] Digest. International Electron Devices Meeting, - Tunable work function dual metal gate technology for bulk and non-bulk CMOS
JaeHoon Lee,, Huicai Zhong,, You-Seok Suh,, Heuss, G., Gurganus, J., Bei Chen,, Misra, V.Year:
2002
Language:
english
DOI:
10.1109/iedm.2002.1175852
File:
PDF, 239 KB
english, 2002