[IEEE IEEE International Electron Devices Meeting - San...

  • Main
  • [IEEE IEEE International Electron...

[IEEE IEEE International Electron Devices Meeting - San Francisco, CA, USA (8-11 Dec. 2002)] Digest. International Electron Devices Meeting, - Tunable work function dual metal gate technology for bulk and non-bulk CMOS

JaeHoon Lee,, Huicai Zhong,, You-Seok Suh,, Heuss, G., Gurganus, J., Bei Chen,, Misra, V.
How much do you like this book?
What’s the quality of the file?
Download the book for quality assessment
What’s the quality of the downloaded files?
Year:
2002
Language:
english
DOI:
10.1109/iedm.2002.1175852
File:
PDF, 239 KB
english, 2002
Conversion to is in progress
Conversion to is failed