[IEEE 2014 IEEE International Conference on Robotics and...

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[IEEE 2014 IEEE International Conference on Robotics and Automation (ICRA) - Hong Kong, China (2014.5.31-2014.6.7)] 2014 IEEE International Conference on Robotics and Automation (ICRA) - Design of a force-decoupled compound parallel alignment stage for high-resolution imprint lithography

Sun, Xiantao, Chen, Weihai, Zhou, Rui, Chen, Wenjie, Zhang, Jianbin
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Year:
2014
Language:
english
DOI:
10.1109/icra.2014.6907184
File:
PDF, 1.08 MB
english, 2014
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