[IEEE 2013 IEEE International Meeting for Future of...

  • Main
  • [IEEE 2013 IEEE International Meeting...

[IEEE 2013 IEEE International Meeting for Future of Electron Devices, Kansai (IMFEDK) - Suita, Japan (2013.06.5-2013.06.6)] 2013 IEEE International Meeting for Future of Electron Devices, Kansai - Leakage current characteristics of new SrBi4Ti4O15/CaBi4Ti4O15 thin-film capacitor with excellent electric stability

Kawahara, Hideaki, Tahara, Naoya, Nomura, Shuhei, Yamashita, Kaoru, Noda, Minoru, Uchida, Hiroshi, Funakubo, Hiroshi
How much do you like this book?
What’s the quality of the file?
Download the book for quality assessment
What’s the quality of the downloaded files?
Year:
2013
Language:
english
DOI:
10.1109/imfedk.2013.6602250
File:
PDF, 405 KB
english, 2013
Conversion to is in progress
Conversion to is failed