Focused ion beam technology and ultimate applications

Semiconductor Science and Technology 2009 / 04 Vol. 24; Iss. 4

Focused ion beam technology and ultimate applications

Gierak, Jacques
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Volume:
24
Language:
english
Journal:
Semiconductor Science and Technology
DOI:
10.1088/0268-1242/24/4/043001
Date:
April, 2009
File:
PDF, 1.93 MB
english, 2009
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