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[IEEE 2008 2nd IEEE International Nanoelectronics Conference - Shanghai, China (2008.03.24-2008.03.27)] 2008 2nd IEEE International Nanoelectronics Conference - The exposure process study of 100KV JBX-6300LS electron-beam nanolithograph system
Qunqing Li,, Lihui Zhang,, Mo Chen,, Shoushan Fan,Year:
2008
DOI:
10.1109/inec.2008.4585685
File:
PDF, 682 KB
2008