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Thin Film Complementary Metal Oxide Semiconductor (CMOS) Device Using a Single-Step Deposition of the Channel Layer
Nayak, Pradipta K., Caraveo-Frescas, J. A., Wang, Zhenwei, Hedhili, M. N., Wang, Q. X., Alshareef, H. N.Volume:
4
Language:
english
Journal:
Scientific Reports
DOI:
10.1038/srep04672
Date:
April, 2014
File:
PDF, 1.04 MB
english, 2014