Growth Kinetics and Properties of Thin Cobalt Films Electrodeposited on n-Si(100)
Lee, Jong Duk, An, Tae Hwan, Noh, Hak Gi, Kim, Sung Gon, Choi, Young R.Volume:
49
Language:
english
Journal:
Japanese Journal of Applied Physics
DOI:
10.1143/JJAP.49.085802
Date:
August, 2010
File:
PDF, 432 KB
english, 2010