Thermal and plasma enhanced atomic layer deposition of...

Journal of Vacuum Science & Technology A Vacuum Surfaces and Films 2015 / 01 Vol. 33; Iss. 1

Thermal and plasma enhanced atomic layer deposition of TiO2: Comparison of spectroscopic and electric properties

Das, Chittaranjan, Henkel, Karsten, Tallarida, Massimo, Schmeißer, Dieter, Gargouri, Hassan, Kärkkänen, Irina, Schneidewind, Jessica, Gruska, Bernd, Arens, Michael
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Volume:
33
Language:
english
Journal:
Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films
DOI:
10.1116/1.4903938
Date:
January, 2015
File:
PDF, 2.65 MB
english, 2015
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