Journal of Vacuum Science & Technology B Microelectronics and Nanometer Structures
2001 Vol. 19; Iss. 4
Low-energy carbon and nitrogen ion implantation in silicon
Barbadillo, L., Hernández, M. J., Cervera, M., Rodrı́guez, P., Piqueras, J., Muñoz-Yagüe, A.Volume:
19
Year:
2001
Language:
english
Journal:
Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures
DOI:
10.1116/1.1381068
File:
PDF, 393 KB
english, 2001