Journal of Vacuum Science & Technology B Microelectronics and Nanometer Structures
2000 Vol. 18; Iss. 1
SiO[sub 2] thickness determination by x-ray photoelectron spectroscopy, Auger electron spectroscopy, secondary ion mass spectrometry, Rutherford backscattering, transmission electron microscopy, and ellipsometry
Cole, D. A., Shallenberger, J. R., Novak, S. W., Moore, R. L., Edgell, M. J., Smith, S. P., Hitzman, C. J., Kirchhoff, J. F., Principe, E., Nieveen, W., Huang, F. K., Biswas, S., Bleiler, R. J., JonesVolume:
18
Year:
2000
Language:
english
Journal:
Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures
DOI:
10.1116/1.591208
File:
PDF, 353 KB
english, 2000