Improvement of temperature homogeneity of a silicon wafer...

Applied Thermal Engineering 2015 / 02 Vol. 77

Improvement of temperature homogeneity of a silicon wafer heated in a rapid thermal system (RTP: Rapid Thermal Process) by a filtering window

Logerais, Pierre-Olivier, Riou, Olivier, Delaleux, Fabien, Durastanti, Jean-Félix, Bouteville, Anne
How much do you like this book?
What’s the quality of the file?
Download the book for quality assessment
What’s the quality of the downloaded files?
Volume:
77
Language:
english
Journal:
Applied Thermal Engineering
DOI:
10.1016/j.applthermaleng.2014.12.013
Date:
February, 2015
File:
PDF, 4.22 MB
english, 2015
Conversion to is in progress
Conversion to is failed