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GaAs and GaAlAs Reactive Ion Etching in BCl 3 -Cl 2 Mixture
Tamura, Hideo, Kurihara, HarukiVolume:
23
Journal:
Japanese Journal of Applied Physics
DOI:
10.1143/JJAP.23.L731
Date:
September, 1984
File:
PDF, 658 KB
1984