Effects of Substrate Temperatures and V/III Ratios on Epitaxial InP Grown by Metalorganic Chemical Vapor Deposition
Uwai, Kunihiko, Susa, Nobuhiko, Mikami, Osamu, Fukui, TakashiVolume:
23
Journal:
Japanese Journal of Applied Physics
DOI:
10.1143/jjap.23.l121
Date:
February, 1984
File:
PDF, 878 KB
1984