Residual layer-free Reverse Nanoimprint Lithography on...

Microelectronic Engineering 2015 / 06 Vol. 141

Residual layer-free Reverse Nanoimprint Lithography on silicon and metal-coated substrates

Fernández, Ariadna, Medina, Juan, Benkel, Christian, Guttmann, Markus, Bilenberg, Brian, Thamdrup, Lasse H., Nielsen, Theodor, Sotomayor Torres, Clivia M., Kehagias, Nikolaos
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Volume:
141
Language:
english
Journal:
Microelectronic Engineering
DOI:
10.1016/j.mee.2014.11.025
Date:
June, 2015
File:
PDF, 2.05 MB
english, 2015
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