FREE ENERGY OF ADSORPTION. I. THE INFLUENCE OF SUBSTRATE STRUCTURE IN THE SiO 2 —H 2 O, SiO 2 —n-HEXANE AND SiO 2 —CH 3 OH SYSTEMS
Every, R. L., Wade, W. H., Hackerman, NormanVolume:
65
Language:
english
Journal:
The Journal of Physical Chemistry
DOI:
10.1021/j100819a008
Date:
January, 1961
File:
PDF, 618 KB
english, 1961