X-Ray Standing Wave Method Applied to the Characterization of InGaAsP Alloy Semiconductor Thin Film
Akimoto, Koichi, Ishikawa, Tetsuya, Takahashi, Toshio, Kikuta, Seishi, Matsui, JunjiVolume:
24
Journal:
Japanese Journal of Applied Physics
DOI:
10.1143/jjap.24.l917
Date:
December, 1985
File:
PDF, 437 KB
1985